- H氢Hydrogen
- He氦Helium
- Li锂Lithum
- Be铍Beryllium
- B硼Boron
- C碳Carbon
- N氮Nitrogen
- O氧Oxygen
- F氟Fluorine
- Ne氖Neon
- Na钠Sodium
- Mg镁Magnesium
- Al铝Aluminium
- Si硅Silicon
- P磷Phosphorus
- S硫Sulfur
- Cl氯Chlorine
- Ar氩Argon
- K钾Potassium
- Ca钙Calcium
- Sc钪Scandium
- Ti钛Titanium
- V钒Vanadium
- Cr铬Chromium
- Mn锰Manganum
- Fe铁Iron
- Co钴Cobalt
- Ni镍Nickel 2
- Cu铜Copper
- Zn锌Zinc
- Ga镓Gallium
- Ge锗Germanium
- As砷Arsenic
- Se硒Selenium
- Br溴Bormine
- Kr氪Krypton
- Rb铷Rubidium
- Sr锶Strontium
- Y钇Yttrium
- Zr锆Zirconium
- Nb铌Niobium
- Mo钼Molybdanium
- Tc碍Technetium
- Ru钌Ruthenium
- Rh铑Rhodium
- Pd钯Palladium
- Ag银Silver
- Cd镉Cadmium
- In铟Inlium
- Sn锡Tin
- Sb锑Antimony
- Te碲Tellurium
- I碘Iodine
- Xe氙Xenon
- Cs铯Caesium
- Ba钡Barium
- LaLu镧系LaLu
- Hf铪Hafnium
- Ta钽Tantalum
- W钨Tungsten
- Re铼Rhenium
- Os锇Osmium
- Ir铱Iridium
- Pt铂Platinum
- Au金Gold
- Hg汞Mercury
- Tl铊Thallium
- Pb铅Lead
- Bi铋Bismuth
- Po钋Polonium
- At砹Astatium
- Rn氡Radon
- La镧Lanthanum
- Ce铈Cerium
- Pr镨Praseodymium
- Nd钕Neodymium
- Pm钷Promethium
- Sm钐Samarium
- Eu铕Europinu
- Gd钆Gadolinium
- Tb铽Terbium
- Dy镝Dysprosium
- Ho钬Holmium
- Er铒Erbium
- Tm铥Thulium
- Yb镱Ytterbium
- Lu镥Lrtetium
Click to view the relevant product information containing the corresponding elements
Ketai new materials can provide customization of any combination of materials with almost all elements (except radioactive elements) in the "yuansuo periodic table". Some products have not been updated in time. Please consult customer service for special customization needs.
- H氢Hydrogen
- He氦Helium
- Li锂Lithum
- Be铍Beryllium
- B硼Boron
- C碳Carbon
- N氮Nitrogen
- O氧Oxygen
- F氟Fluorine
- Ne氖Neon
- Na钠Sodium
- Mg镁Magnesium
- Al铝Aluminium
- Si硅Silicon
- P磷Phosphorus
- S硫Sulfur
- Cl氯Chlorine
- Ar氩Argon
- K钾Potassium
- Ca钙Calcium
- Sc钪Scandium
- Ti钛Titanium
- V钒Vanadium
- Cr铬Chromium
- Mn锰Manganum
- Fe铁Iron
- Co钴Cobalt
- Ni镍Nickel 2
- Cu铜Copper
- Zn锌Zinc
- Ga镓Gallium
- Ge锗Germanium
- As砷Arsenic
- Se硒Selenium
- Br溴Bormine
- Kr氪Krypton
- Rb铷Rubidium
- Sr锶Strontium
- Y钇Yttrium
- Zr锆Zirconium
- Nb铌Niobium
- Mo钼Molybdanium
- Tc碍Technetium
- Ru钌Ruthenium
- Rh铑Rhodium
- Pd钯Palladium
- Ag银Silver
- Cd镉Cadmium
- In铟Inlium
- Sn锡Tin
- Sb锑Antimony
- Te碲Tellurium
- I碘Iodine
- Xe氙Xenon
- Cs铯Caesium
- Ba钡Barium
- LaLu镧系LaLu
- Hf铪Hafnium
- Ta钽Tantalum
- W钨Tungsten
- Re铼Rhenium
- Os锇Osmium
- Ir铱Iridium
- Pt铂Platinum
- Au金Gold
- Hg汞Mercury
- Tl铊Thallium
- Pb铅Lead
- Bi铋Bismuth
- Po钋Polonium
- At砹Astatium
- Rn氡Radon
- La镧Lanthanum
- Ce铈Cerium
- Pr镨Praseodymium
- Nd钕Neodymium
- Pm钷Promethium
- Sm钐Samarium
- Eu铕Europinu
- Gd钆Gadolinium
- Tb铽Terbium
- Dy镝Dysprosium
- Ho钬Holmium
- Er铒Erbium
- Tm铥Thulium
- Yb镱Ytterbium
- Lu镥Lrtetium
APPLICATION AREA
5G领域 Related introduction：
5G芯片用靶材/5G通信用靶材主要是指制作氮化铝钪薄膜用靶材，目前有2种镀膜工艺，一种是反应溅射，直接用铝钪合金靶材通过反应溅做出氮化铝钪合金膜，另一种是采用直接镀膜工艺，采用氮化铝钪靶材直接做出氮化铝钪薄膜。两种方法各有优缺点，都是不错的选择，科泰新材料为不同客户提供不同的选择，科泰开发的铝钪合金靶和氮化铝钪靶都能很好的满足用户要求。
Be applied to 5G领域 Related products
-
Germanium antimony tellurium sputtering targets (Ge2Sb2Te5)
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Yttrium tube（Y）
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Palladium foil(Pd)
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Aluminum copper iron molybdenum nickel alloy sputtering targets(AlCuFeMoNi)
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Molybdenum crucible(Mo)
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Silicon monoxide granule（SiO）
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Cerium granule(Ce)
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Copper titanium manganese alloy sputtering targets（CuTiMn）
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Germanium ring(Ge)
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Cerium zirconium alloy rod (CeZr)
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Titanium sputtering targets(Ti）
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Copper sputtering target (Cu)
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Tin block (Sn)
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Niobium doped titanium dioxide sputtering targets(TiO2-Nb）
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Silver indium alloy sputtering targets（AgIn）
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Nickel titanium alloy block（NiTi）
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Tungsten silicon alloy sputtering targets（WSi）
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Indium oxide doped molybdenum oxide (IMO) sputtering targets In2O3-MoO3
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Tantalum nickel alloy sputtering targets（TaNi）
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Aluminum titanium manganese alloy sputtering targets(AlTiMn)
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Boron nitride doped titanium diboride crucible（BN-TiB2）
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Nickel ytrium alloy piece （NiY）
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Aluminium zirconium yttrium alloy sputtering targets(AlZrY)
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Nickel chromium oxide doped with nickel sputtering targets(NiO-Cr2O3-Ni)
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Aluminum nickel chromium alloy sputtering targets（AlNiCr）
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Tantalum doped molybdenum disulfide sputtering targets（MoS2-Ta）
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Bismuth sputtering targets(Bi)
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Samarium iron alloy sputtering targets（SmFe）
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Titanium dioxide doped with vanadium sputtering targets（TiO2-V）
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Tin monoxide sputtering targets(SnO)
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Molybdenum silicon aluminum sputtering targets（MoSiAl）
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Cerium magnesium alloy granule（CeMg）
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Silicon carbide rod（SiC）
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Copper tin alloy sputtering targets（CuSn）
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Tungsten oxide granule WOx(x≈2)
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Nickel tungsten alloy sputtering targets（NiW）
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Bismuth terbium ferrite sputtering targets（BiTb2Fe5O12）
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Germanium manganese alloy sputtering targets(GeMn)
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Lead granule（Pb）
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Calcium tungstate sputtering targets(CaWO4)
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Gallium phosphide granule(GaP)
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Bismuth antimony tellurium sputtering targets(BiSbTe)
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Aluminum magnesium alloy granule(AlMg)
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Zinc sulfide doped with zinc sputtering targets(ZnS-Zn)
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Nickel granule（Ni）
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Vanadium oxide sputtering targets V2Ox(x≈3)
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Tungsten telluride sputtering targets(WTe2)
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Germanium Phosphide Sputtering Targets(GeP)
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zinc sputtering targets(Zn)
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zinc granule(Zn)
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Gadolinium oxide sputtering targets(Gd2O3)
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Aurum granule（Au）
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Nickel silicon sputtering targets(NiSi)
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Titanium chrome alloy rod（TiCr）
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Ytterbium fluoride sputtering targets（YbF3）
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Samarium nickel sputtering targets（SmNiO3）
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Samarium oxide sputtering targets(Sm2O3)
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Tantalum tungsten alloy sputtering targets（TaW）
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Tungsten carbide granule（WC）
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Copper zinc alloy sputtering targets（Cu-Zn）
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Europium granule(Eu)
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Lithium manganate sputtering targets（LiMn2O4）
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Iron aluminum vanadium tungsten alloy sputtering targets（FeAlVW）
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Zinc oxide doped with magnesium fluoride sputtering targets（ZnO-MgF2）
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Titanium nitride ring（TiN）
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Niobium disulfide sputtering targets（NbS2）
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Iron selenide sputtering targets (FeSe)
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Lithium iron phosphate sputtering targets(LiFePO4)
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Copper indium oxide sputtering targets(CuInO2)
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Gadolinium oxide granule(Gd2O3)
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Zinc antimonide sputtering targets(ZnSb)
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Vanadium sputtering targets（V）
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Bismuth iron titanium oxide（BFTO)sputtering targets Bi5FeTi3O15
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Indium oxide doped tungsten oxide（IWO）sputtering targets(In2O3-WO3)
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Titanium zirconium niobium tin vanadium alloy（TiZrNbSnV）
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Ferrocarbon alloy granule（FeC）
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Lanthanum bismuth ferrite sputtering targets(LaBiFeO3)
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Nickel silicon granule（NiSi）
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Barium strontium vanadate sputtering targets（BaSrVO3）
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Bismuth tin silver ytterbium strontium alloy rod (BiSnAgYbSr)
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Samarium granule(Sm)
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Aluminum titanium nitrogen sputtering targets（AlTiN）
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Niobium carbide sputtering targets(NbC)
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Calcium yttrium fluoride granule(YCaF2)
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Bismuth oxide sputtering targets（Bi2O3）
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Gadolinium granule(Gd)
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Manganese granule（Mn)
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Zinc oxide doped with silicon oxide sputtering targets(ZnO-SiO2)
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Graphite (Carbon) Granule C
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Cuprous oxide sputtering targets(Cu2O)
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Manganese tin sputtering targets (Mn3Sn)
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Aluminium silicon granule（AlSi）
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Nickel oxide doped with lithium oxide sputtering targets（NiO-Li2O）
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YBa2Cu3O7-Ba2YNbO6-Ba2YTaO6 sputtering targets
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silicon germanium granule P type(SiGe)
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LCMO sputtering targets (LaCaMNO3)
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Copper Boron Granule(CuB)
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Selenium telluride sputtering targets（SeTe）
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Silicon germanium granule(SiGe)
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Molybdenum telluride sputtering targets(MoTe2)
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Ferronickel alloy granule（NiFe）
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Nickel copper zinc iron oxide sputtering targets(NiCuZnFe2O4)
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Cerium iron alloy granule（CeFe）
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SrCoO3 sputtering targets(SrCoO3)
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Antimony doped germanium sputtering targets(SbGe)
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Bismuth antimonide granule(BiSb)
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BYTO sputtering targets（Ba2YTaO6）
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Germanium Tin Alloy Granule（Ge-Sn）
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Lithium cobalate sputtering targets（LiCoO2）
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IGZO sputtering targets (In2O3-Ga2O3-ZnO)
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Yttrium barium copper oxide doped with yttrium oxide sputtering targets（YBa2Cu3O7-Y2O3）
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Iron granule(Fe)
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Molybdenum oxide sputtering targets（MoOX）
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Aluminum silicon copper granule（Al-Cu-Si）
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Yttrium aluminum oxide sputtering targets(Y3Al5O12)
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Yttrium barium copper oxide sputtering targets(YBa2Cu3O7)-YBCO
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ITO sputtering targets（In2O3-SnO2）
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AZO sputtering targets（Al2O3-ZnO）
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Germanium antimony tellurium sputtering targets (Ge1Sb2Te4)
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Indium antimony tellurium sputtering targets(In3SbTe2)
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Indium oxide doped with ceria sputtering targets(In2O3-CeO2)
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Zinc oxide doped with magnesium oxide sputtering targets(ZnO-MgO)
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Zinc oxide doped with dysprosium oxide sputtering targets(ZnO-Dy2O3)
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Zinc oxide mixed with zinc sulfide sputtering targets(ZnS-ZnO)
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Tin oxide doped tantalum oxide doped niobium oxide sputtering targets(SnO2-Ta2O5-Nb2O5)
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Tungsten oxide doped ceria doped tin sputtering targets(WO3-CeO2-Sn)
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Copper oxide doped with lithium oxide sputtering targets(CuO-LiO2)
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Ceria doped gadolinium oxide sputtering targets(CeO2+Gd2O3)
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Samarium oxide doped with cerium oxide sputtering targets(Sm203+CeO2)
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Gallium oxide doped tantalum oxide doped silicon oxide sputtering targets(Ga2O3-Ta2O5-SiO2)
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Hafnium oxide doped with silicon oxide sputtering targets(HfO2-SiO2)
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Germanium doped silicon oxide rod(SiO2-Ge)
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Silicon oxide doped with neodymium oxide sputtering targets(SiO2-Nd2O3)
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Erbium oxide doped yttrium oxide doped alumina sputtering targets(Er2O3-Y2O3-Al2O3)
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Bismuth oxide doped vanadium pentoxide doped molybdenum oxide sputtering targets(Bi2O3-V2O3-MoO3)
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Cadmium selenide doped tellurium sputtering targets(CdSe-Te)
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Copper indium sulfide sputtering targets(CuInS2)
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Copper indium gallium selenium sputtering targets(CuInGaSe)
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Copper aluminum oxide sputtering targets(CuAlO2)
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Copper gallium oxide sputtering targets(CuGaO2)
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Bismuth ferrite sputtering targets(BiFeO3)
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Antimony tellurium selenium sputtering targets(Sb2SeTe2.5)
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Strontium titanate sputtering targets(SrTiO3)
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Calcium lead titanate sputtering targets((Pb0.59Ca0.41)TiO3)
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Titanium doped with silicon sputtering targets(Ti-Si)
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Barium titanate sputtering targets(BaTiO3)
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Titanium boride doped titanium sputtering targets(Ti-TiB2)
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Caesium tungsten bronze sputtering targets(Cs0.33WO3)
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Neodymium strontium nickel oxide sputtering targets（NdSrNiO3）
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Lithium nickelate sputtering targets(LiNiO2)
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Lanthanum praseodymium samarium neodymium europium strontium niobate sputtering targets (LaPrNdSmEu)SrNiO3
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lithium niobate sputtering targets(LiNbO3)
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Lithium aluminate sputtering targets(LiAlO2)
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Aluminium zirconium silicon sputtering targets(Al-Zr-Si)
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Lithium phosphate sputtering targets(Li3PO4)
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Lithium nickel cobalt manganese oxide sputtering targets(Li(Ni0.8Co0.1Mn0.1)O2)
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Silicon doped with tin sputtering targets(Si-Sn)
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Sodium cobalate sputtering targets(NaCoO2)
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Aluminium cobalate sputtering targets(CoAl2O4)
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Lanthanum cobalate sputtering targets(LaCoO3)
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Chromium doped with silicon monoxide sputtering targets（Cr-SiO)
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Tantalum doped titanium dioxide target sputtering targets(TiO2-Ta)
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Tungsten doped vanadium dioxide sputtering targets(VO2+W)
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Ytterbium nitride doped aluminum nitride sputtering targets(YbN-AlN)
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Bismuth selenium tellurium sputtering targets（Bi-Se-Te)
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Barium strontium cobalt ferrite sputtering targets(BaSrCoFeO3)
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Lead zirconium titanate（PZT） sputtering targets Pb(Zr52Ti48)O3
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Yttrium iron oxide sputtering targets(Y3Fe5O12)
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Germanium oxide sputtering targets（GeO2）
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IZO sputtering targets（In2O3-ZnO）
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Indium oxide sputtering targets（In2O3）
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Ytterbium oxide pellet（Yb2O3）
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Yttria stabilized zirconia sputtering targets（YSZ）
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Yttrium oxide sputtering targets（Y2O3）
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Zinc oxide evaporation coating material（ZnO）
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zinc oxide sputtering targets（ZnO）
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Stannic oxide sputtering targets（SnO2）
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Tungsten trioxide pellet(WO3)
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Tungsten trioxide sputtering targets（WO3）
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Copper oxide sputtering targets（CuO）
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Antimony oxide sputtering targets（Sb2O3）
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Tantalum oxide sputtering targets（Ta2O5）
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Black titanium oxide sputtering targets（TiOx）
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Cerium oxide pellet(CeO2)
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Cerium oxide sputtering targets(CeO2)
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Nickel oxide sputtering targets（NiO）
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Niobium oxide pellet(Nb2O5)
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Niobium oxide sputtering targets（NbOx）
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Magnesium oxide sputtering targets（MgO）
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Alumina evaporation coating material（Al2O3）
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Aluminum oxide sputtering targets(Al2O3)
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Lithium oxide sputtering targets(Li2O)
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Gallium oxide sputtering targets（Ga2O3）
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Holmium oxide sputtering targets(Ho2O3)
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Hafnium oxide sputtering targets（HfO2）
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Zirconia pellet(ZrO2)
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Zirconia sputtering targets(ZrO2)
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Erbium oxide sputtering targets
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Trititanium pentoxide pellet(Ti3O5)
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Vanadium pentoxide pellet(V2O5)
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