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| 氧化铝靶材(Al2O3)essential information | |
| Molecular formula | Al2O3 |
| purity | 99.99% |
| CAS No | 1344-28-1 |
| Molar mass | 101.96 |
| density | 3.5 g/cm³ |
| melting point | 2054ºC |
| boiling point | 2980 ℃ |
| Solubility (water) | 不溶于水,易溶于强碱和强酸 |
氧化铝(Al₂O₃,氧化铝 / 刚玉)陶瓷溅射靶,以高纯氧化铝粉体经成型、高温烧结制成,白色致密陶瓷;高硬度、高绝缘、宽禁带、耐温耐蚀、化学稳定性优异;属于绝缘氧化物靶,溅射必须采用射频(RF)磁控溅射,易起弧,生产上对致密度、晶粒均匀性要求高,致密度越高,镀膜越稳定、少针孔、少打火。可做成圆靶、方靶、管状靶,绑定铜背靶使用。
| 氧化铝靶材(Al2O3)Product application |
薄膜应用:
1. 光伏行业:晶硅电池背面钝化层(Al₂O₃负电钝化,提升开路电压、转换效率)、钙钛矿电池阻挡 / 绝缘保护层
2. 半导体:器件钝化层、栅介质层、扩散阻挡层、薄膜电容介电层、晶圆封装绝缘膜
3. 光学镀膜:镜头增透膜、红外窗口保护膜、光学干涉膜、耐磨抗腐蚀光学涂层
4. 显示 / LED:TFT、OLED、Micro-LED 内部透明绝缘介质层
5. 防护涂层:耐磨、耐蚀、耐高温防护膜,传感器、航天、精密零件保护层