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硅锆钇靶材(SiZrY)

硅锆钇靶材(SiZrY)
  • 硅锆钇靶材(SiZrY)
硅锆钇靶材(SiZrY)essential information
Molecular formulaSiZrY
purity99.5%
CAS No
Molar mass
density
melting point
boiling point
Solubility (water)

硅锆钇靶材(SiZrY)Product overview


        采用半导体级硅(≥99.999%)、核级海绵锆(Hf<100ppm)及高纯氧化钇(Y₂O₃≤30ppm),通过 等离子旋转电极雾化(PREP)+ 放电等离子烧结(SPS) 制备的耐极端环境多功能靶材。核心参数:

精密成分梯度(Zr 5-40at.% / Y 0.5-8at.%)

双相纳米结构(非晶基体+5-50nm Y-Si析出相)

理论密度>99.1%(闭孔率<0.3%)

氧含量<80ppm(C/N<15ppm)
    在反应磁控溅射中实现 膜层硬度8-15GPa可调,1200℃氧化增重 <1mg/cm²。

技术突破源于钇的界面工程效应

➊极端环境防护

·熔盐腐蚀速率 <0.01mm/year(FLiNaK@750°C)

·中子辐照肿胀率 <0.3%(1021 n/cm?注量)

➋ 智能表面特性

·自修复氧化层(Y,0:动态填充裂纹)

·氢渗透率 <10-14 mol H,/m·s·Pa(聚变堆阻氚层)

➌ 多功能集成

·电阳率 10-3~105 Ω·cm可调(相组成调控)

·红外发射率 0.85-0.92(3-5um波段)


硅锆钇靶材(SiZrY)Product application

核心应用场景​
◉ ​第四代核能系统​
▸ 熔盐堆结构材料防护层(耐腐蚀寿命>15年)
▸ 快堆燃料包壳涂层(氢脆抑制率>90%)
◉ ​太空装备防护​
▸ 空间站舱体防原子氧膜(侵蚀率<0.1μm/year)
▸ 深空探测器热控涂层(太阳吸收比αs=0.92)
◉ ​半导体特种器件​
▸ 3D NAND电荷陷阱层(存储窗口>8V)
▸ 功率器件钝化层(界面态密度<1010 cm-2·eV-1)
◉ ​新能源关键部件​
▸ 电解槽耐酸电极(过电位<150mV@1A/cm²)
▸ SOFC连接体涂层(ASR<0.05Ω·cm²)

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